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Materials Science in Semiconductor Processing, Vol. 5, Iss. 4, 2002-08 ,pp. : 425-428

Elsevier

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Doubleside polishing-a technology mandatory for 300mm wafer manufacturing

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Wafer-scale processing technology for monolithically integrated GaSb thermophotovoltaic device array on semi-insulating GaAs substrate

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A wafer fault diagnosis scheme

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Evaluation of Si-Wafer Chemical Cleaning Procedures in Terms of Their Effect on Wafer Topography

By Timoshenkov S. P.   Kalugin V. V.   Prokopiev E. P.  

Russian Microelectronics, Vol. 32, Iss. 6, 2003-11 ,pp. : 371-376

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