Use of the 'mist' (liquid-source) deposition system to produce new high-dielectric devices: ferroelectric-filled photonic crystals and Hf-oxide and related buffer layers for ferroelectric-gate FETs

Author： Morrison F.D.   Scott J.F.   Alexe M.   Leedham T.J.   Tatsuta T.   Tsuji O.  

Publisher： Elsevier

ISSN： 0167-9317

Source： Microelectronic Engineering, Vol.66, Iss.1, 2003-04, pp. : 591-599

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