Dislocation behavior in heavily germanium-doped silicon crystal

Author: Taishi T.   Huang X.   Yonenaga I.   Hoshikawa K.  

Publisher: Elsevier

ISSN: 1369-8001

Source: Materials Science in Semiconductor Processing, Vol.5, Iss.4, 2002-08, pp. : 409-412

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract