Etching Properties of HfO2 Thin Films in Cl2/BCl3/Ar Plasma

Author： Kim Dong-Pyo Kim Gwan-Ha Woo Jong-Chang Yang Xue Um Doo-Seung Kim Chang-Il

ISSN： 0015-0193

Source： Ferroelectrics, Vol.381, Iss.1, 2009-01, pp. : 30-40

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