A replacement of high-k process for CMOS transistor by atomic layer deposition

Author: Han Jin-Woo     Yang J Joshua   Moon Dong-Il   Choi Yang-Kyu   Williams R Stanley   Meyyappan M  

Publisher: IOP Publishing

ISSN: 0268-1242

Source: Semiconductor Science and Technology, Vol.28, Iss.8, 2013-08, pp. : 82003-82006

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Abstract