Effect of Pre-annealing to Blocking Oxide on the Performance of Dual Trapping-layer Engineered Charge Trapping Memory

Author: Chen Guoxing   Huo Zongliang   Han Yulong   Li Xinkai   Zhang Dong   Liu Su   Liu Ming  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.151, Iss.1, 2014-02, pp. : 56-60

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