Investigation of iridium as a gate electrode for deep sub-micron CMOS technology

Author: Pawlak M.A.   Schram T.   Maex K.   Vantomme A.  

Publisher: Elsevier

ISSN: 0167-9317

Source: Microelectronic Engineering, Vol.70, Iss.2, 2003-11, pp. : 373-376

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