Author: Lee Bong-Kee
Publisher: Springer Publishing Company
ISSN: 0946-7076
Source: Microsystem Technologies, Vol.14, Iss.9-11, 2008-10, pp. : 1739-1744
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Reflectivity test of X-ray mirrors for deep X-ray lithography
By Nazmov V.
Microsystem Technologies, Vol. 14, Iss. 9-11, 2008-10 ,pp. :
A Si stencil mask for deep X-ray lithography fabricated by MEMS technology
Microsystem Technologies, Vol. 14, Iss. 9-11, 2008-10 ,pp. :
Micro gas bearings fabricated by deep X-ray lithography
By Kim D. Lee S. Jin Y. Desta Y. Bryant M. D. Goettert J.
Microsystem Technologies, Vol. 10, Iss. 6-7, 2004-10 ,pp. :