Growth of epitaxial SiGe nanostructures at low temperature on Si(100) using hot-wire assisted gas source molecular beam epitaxy

Author: Koulmann J.J.   Chelly R.   Angot T.   Louis P.   Bolmont D.   Werckmann J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.294, Iss.1, 1997-02, pp. : 84-87

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Abstract