In situ spectroscopic ellipsometry for the characterization of polysilicon formation inside a vertical furnace

By Petrik P.   Lehnert W.   Schneider C.   Fried M.   Lohner T.   Gyulai J.   Ryssel H.  

Thin Solid Films, Vol. 364, Iss. 1, 2000-03 ,pp. : 150-155

Elsevier

Access to resources Recommend Favorite

In situ spectroscopic ellipsometry in vertical furnace: monitoring and control of high-temperature processes

By Petrik P.   Schneider C.  

Vacuum, Vol. 61, Iss. 2, 2001-05 ,pp. : 427-434

Elsevier

Access to resources Recommend Favorite

Spectroscopic ellipsometry study of amorphous silicon anodically oxidised

By Aguas H.   Goncalves A.   Pereira L.   Silva R.   Fortunato E.   Martins R.  

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 345-349

Elsevier

Access to resources Recommend Favorite

Thickness change in an annealed amorphous silicon film detected by spectroscopic ellipsometry

By Yamaguchi T.   Kaneko Y.   Jayatissa A.H.   Aoyama M.  

Thin Solid Films, Vol. 279, Iss. 1, 1996-06 ,pp. : 174-179

Elsevier

Access to resources Recommend Favorite

Hydrogen-plasma etching of hydrogenated amorphous silicon: a study by a combination of spectroscopic ellipsometry and trap-limited diffusion model

By Kaïl F.  

Philosophical Magazine, Vol. 84, Iss. 6, 2004-02 ,pp. : 595-609

Taylor & Francis Ltd

Access to resources Recommend Favorite