Preparation and characterization of carbon nitride thin films

By Wan L.   Egerton R.F.  

Thin Solid Films, Vol. 279, Iss. 1, 1996-06 ,pp. : 34-42

Elsevier

Access to resources Recommend Favorite

Compositional characterization of silicon nitride thin films prepared by RF-sputtering

By Vila M.   Martn-Gago J.A.   Munoz-Martn A.   Prieto C.   Miranzo P.   Osendi M.I.   Garca-Lopez J.   Respaldiza M.A.  

Vacuum, Vol. 67, Iss. 3, 2002-09 ,pp. : 513-518

Elsevier

Access to resources Recommend Favorite

Growth of highly (0001)-oriented aluminum nitride thin films with smooth surfaces on silicon carbide by gas-source molecular beam epitaxy

By Kern R.S.   Smith S.A.   Jarrendahl K.   Zheleva T.   Davis R.F.  

Vacuum, Vol. 49, Iss. 3, 1998-03 ,pp. : 189-191

Elsevier

Access to resources Recommend Favorite

X-ray double crystal and X-ray topographic characterization of silicon carbide thin films on silicon, titanium carbide, 6H-silicon carbide, and aluminum nitride/sapphire substrates

By Chaudhuri J.   Thokala R.   Edgar J.H.   Sywe B.S.  

Thin Solid Films, Vol. 274, Iss. 1, 1996-03 ,pp. : 23-30

Elsevier

Access to resources Recommend Favorite

Deposition and optical studies of silicon carbide nitride thin films

By Sundaram K.B.   Alizadeh J.  

Thin Solid Films, Vol. 370, Iss. 1, 2000-07 ,pp. : 151-154

Elsevier

Access to resources Recommend Favorite