Device-quality polycrystalline silicon films deposited at low process temperatures by hot-wire chemical vapor deposition

By Saha S.C.   Guillet J.   Equer B.   Bouree J.E.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 248-252

Elsevier

Access to resources Recommend Favorite

Gas phase and surface kinetic processes in polycrystalline silicon hot-wire chemical vapor deposition

By Holt J.K.   Swiatek M.   Goodwin D.G.   Muller R.P.   Goddard W.A.   Atwater H.A.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 29-35

Elsevier

Access to resources Recommend Favorite

Investigation of scaling-up issues in hot-wire CVD of polycrystalline silicon

By van der Werf C.H.M.   Hardeman A.J.   van Veenendaal P.A.T.T.   van Veen M.K.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 41-45

Elsevier

Access to resources Recommend Favorite

Microcrystalline silicon for solar cells deposited at high rates by hot-wire CVD

By Iwaniczko E.   Xu Y.   Schropp R.E.I.   Mahan A.H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 212-215

Elsevier

Access to resources Recommend Favorite

The influence of the filament temperature on the structure of hot-wire deposited silicon

By van der Werf C.H.M.   van Veenendaal P.A.T.T.   van Veen M.K.   Hardeman A.J.   Rusche M.Y.S.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 46-49

Elsevier

Access to resources Recommend Favorite