Influence of gas supply and filament geometry on the large-area deposition of amorphous silicon by hot-wire CVD

By Ledermann A.   Weber U.   Mukherjee C.   Schroeder B.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 61-65

Elsevier

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The influence of filament temperature on crystallographic properties of poly-Si films prepared by the hot-wire CVD method

By Lee J.C.   Kang K.H.   Kim S.K.   Yoon K.H.   Song J.   Park I.J.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 188-193

Elsevier

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Spectroscopic and kinetic ellipsometry studies of hot-wire deposited polycrystalline silicon on glass

By van Veenendaal P.A.T.T.   van der Mark G.W.M.   Rath J.K.   Schropp R.E.I.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 41-45

Elsevier

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Microcrystalline silicon for solar cells deposited at high rates by hot-wire CVD

By Iwaniczko E.   Xu Y.   Schropp R.E.I.   Mahan A.H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 212-215

Elsevier

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High-rate deposition of amorphous silicon films using hot-wire CVD with a coil-shaped filament

By Povolny H.S.   Deng X.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 125-129

Elsevier

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