Deposition of HWCVD poly-Si films at a high growth rate

Author: Rath J.K.   Hardeman A.J.   van der Werf C.H.M.   van Veenendaal P.A.T.T.   Rusche M.Y.S.   Schropp R.E.I.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.430, Iss.1, 2003-04, pp. : 67-72

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Abstract