Monte Carlo simulation of argon atoms transport during deposition of W thin films by RF-dc coupled magnetron sputtering

Author： Petrov P.K. Volpyas V.A. Hollmann E.K. Kawabata K. Tanaka T.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.48, Iss.7, 1997-09, pp. : 669-670

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