Atomic layer doping of SiGe by low pressure (rapid thermal) chemical vapor deposition

Author: Tillack B.   Kruger D.   Gaworzewski P.   Ritter G.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.294, Iss.1, 1997-02, pp. : 15-17

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