Homogeneous and heterogeneous reactions in the decomposition of precursors for the MOCVD of high-k and ferroelectric films

Author: Condorelli G.G.   Baeri A.   Fragala I.L.   Lauretta V.   Smerlo G.  

Publisher: Elsevier

ISSN: 1369-8001

Source: Materials Science in Semiconductor Processing, Vol.5, Iss.2, 2002-04, pp. : 135-139

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Abstract