Challenges of back end of the line for sub 65 nm generation

Author: Fayolle M.   Passemard G.   Louveau O.   Fusalba F.   Cluzel J.  

Publisher: Elsevier

ISSN: 0167-9317

Source: Microelectronic Engineering, Vol.70, Iss.2, 2003-11, pp. : 255-266

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