Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition

Author: Flewitt A.J.   Dyson A.P.   Robertson J.   Milne W.I.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.383, Iss.1, 2001-02, pp. : 172-177

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