Photoemission study of the interaction of a Pr 2 O 3 overlayer with Si(100) as a function of annealing temperature

Author： Wang Z.M. Wu J.X. Ma M.S. Chen W. Fang Q. Zhang J.-Y.

Publisher： Elsevier

ISSN： 0167-9317

Source： Microelectronic Engineering, Vol.66, Iss.1, 2003-04, pp. : 608-614

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