Carrier mobility in advanced CMOS devices with metal gate and HfO 2 gate dielectric

Author： Lime F.   Oshima K.   Casse M.   Ghibaudo G.   Cristoloveanu S.   Guillaumot B.   Iwai H.  

Publisher： Elsevier

ISSN： 0038-1101

Source： Solid-State Electronics, Vol.47, Iss.10, 2003-10, pp. : 1617-1621

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