A new damascene architecture for high-performance metal-insulator-metal capacitors integration

Author： Farcy A.   Torres J.   Arnal V.   Fayolle M.   Feldis H.   Jourdan F.   Assous M.   Di Maria J.L.   Vidal V.  

Publisher： Elsevier

ISSN： 0167-9317

Source： Microelectronic Engineering, Vol.70, Iss.2, 2003-11, pp. : 368-372

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Effect of Electrolyte on the Performance of Anodic Titania Metal-Insulator-Metal Capacitors

By Karthik R.   Kannadassan D.   Baghini Maryam Shojaei   Mallick P.S.  

Journal of Nanoelectronics and Optoelectronics, Vol. 8, Iss. 3, 2013-03 ,pp. : 311-315

American Scientific Publishers

Access to resources Recommend Favorite

Graphene oxide-based flexible metal-insulator-metal capacitors

By Bag A.   Mallik S.   Maiti C.K.   Hota M.K.  

Semiconductor Science and Technology, Vol. 28, Iss. 5, 2013-05 ,pp. : 55002-55008

IOP Publishing

Access to resources Recommend Favorite

Ionizing radiation effect on metal–ferroelectric–insulator–semiconductor memory capacitors

By YanS A   LiG   ZhaoW   GuoH X   XiongY   TangM H   LiZ   XiaoY G   ZhangW L   LeiZ F   ZhouY C  

Semiconductor Science and Technology, Vol. 30, Iss. 8, 2015-08 ,pp. : 85020-85027

IOP Publishing

Access to resources Recommend Favorite

Metal-insulator-semiconductor capacitors with water-containing hexagonal mesoporous silica (MCM-41) dielectric and high values of capacitance per unit area

By  

Semiconductor Science and Technology, Vol. 30, Iss. 4, 2015-01 ,pp. : 45003-45008

IOP Publishing

Access to resources Recommend Favorite

Forming-Free Reversible Bipolar Resistive Switching Behavior in Al-Doped HfO 2 Metal-Insulator-Metal Devices

By Mahapatra R.  

Journal of Electronic Materials, Vol. 41, Iss. 4, 2012-04 ,pp. : 656-659

Springer Publishing Company

Access to resources Recommend Favorite